High Purity Titanium Sputtering Target, Planar

Genel bilgi

  • Saflık: 99.99%, 99.995%
  • Size and Shape: Customized Production Or According To The Drawings.
  • Surface Treatment: CNC lathe

Titanium Sputtering Target can be mainly used in the electronics and information industries, such as integrated circuits, information storage, liquid crystal displays, laser memories, electronic control devices, etc.

Technics: Forged and CNC Machined.

Tip: Planar Target

Specification Of Titanium Sputtering Target

NotlarGrade 1, grade2
ŞekilDiscs, Rectangle, Tube (Rotary target), Plate
Boyut

Round target : 40*17, 63*32, 62*38, 100*32, 100*40, 100*45, 152.4*42Plate target: 8*133*140, 8*153*1108, 10*53.6*585, 10*159*1519;

Tube target: 141**125*1550, 89.4*8*1960, 152*125*966. 152*125*1566, 70*56*1050, 70*56*2100;

YüzeyDescaled, sandblasted, ground, rough turned, precision turned, polished
Delivery ConditionHot rolled, Cold worked, Annealing, Quenching

Applications Of Titanium Target

With the rapid development of semiconductors, electronic information and other high-tech fields, the amount of high purity titanium in target materials is increasing. Titanium targets made by sputtering coating technologies have the higher purity and smaller possible average grain sizes for use in semiconductor, electronic information, physical vapor deposition (PVD) display, chemical vapor deposition (CVD) and optical applications.

Semiconductor applications sector:

  • Flat Panel Display
  • Integrated Circuits

Yutong Metal specializes in producing various of titanium products, high purity titanium sputtering targets for the semiconductor and electronic information industry with the shape of plate, disc and tubing.