Mục tiêu phún xạ quay, Niobi

Thông tin chung

  • độ tinh khiết: 99.9%, 99.95%
  • Kích cỡ: Diameter: 50-150mm; Length: 200-3800mm
  • Kiểu: Rotary Sputtering Target

The Rotary Niobium Sputtering Target is equipped with excellent sputtering source that forms a functional thin film on a substrate by magnetron sputtering, multi-arc ion plating or other types of coating systems under appropriate process conditions. Due to the high performance, it has widely used in semiconductor integrated circuits, optical discs, flat displays, and surface coatings of workpieces.

  • Molding process: spraying
  • Density: > 8.5 g/cm3
  • Impurity content (unit: PPM, total impurity content ≤ 1000ppm)
Rotary Sputtering Target, Niobium

As a major raw material used in coating, the inherent characteristics of the target, such as its shape, purity, density, porosity, grain size, and bonding quality, have a significant impact on both film quality and sputtering rate. Superior-quality targets not only ensure top-notch film quality but also contribute to extending the lifespan of Low-e products. More importantly, they can reduce production costs, enhance production efficiency, and yield substantial economic benefits for the sputter-coating glass industry.

Insufficient purity in the sputtering target may lead to impurity particles adhering to the substrate during the sputtering process, causing instability and delamination in certain film layers. The higher the purity of the target, the better the performance of the prepared film.