Tantalum sputtering targets is mainly used in integrated circuits and Thin Film Transistor Liquid Crystal Display (TFT-LCD).
Manufacturing Process
- Refining
– Multiple step electron beam melting
- Grain refinement
– Thermomechanical treatment
Applications Of Tantalum Sputtering Targets
- Electronics: Tantalum Targets are widely used in the electronics industry for the deposition of tantalum films in integrated circuits, capacitors, and other microelectronic components. The high purity and corrosion resistance of tantalum makes it an ideal material for these applications.
- Optics: The Ta Sputtering Targets are also used in the optical industry for the deposition of tantalum films on optical components, such as lenses and mirrors. The high transparency and hardness of tantalum make it suitable for this application.
- Thin-film solar energy: Tantalum Sputtering Targets are employed in the production of thin-film solar cells. The deposition of tantalum films on solar cells enhances their efficiency and reliability.
- Magnetic storage: In the magnetic storage industry, Tantalum Sputtering Targets are used to deposit tantalum films on magnetic disks and tapes, improving their durability and performance.
- Decorative coatings: Due to the attractive appearance of tantalum, Tantalum Sputtering Targets are also used in the production of decorative coatings for various consumer products, such as jewelry and watches.
