Titanium Sputtering Target can be mainly used in the electronics and information industries, such as integrated circuits, information storage, liquid crystal displays, laser memories, electronic control devices, etc.
Technics: Forged and CNC Machined.
タイプ： Planar Target
Specification Of Titanium Sputtering Target
| グレード | Grade 1, grade2 |
| 形 | Discs, Rectangle, Tube (Rotary target), Plate |
| サイズ | Round target : 40*17, 63*32, 62*38, 100*32, 100*40, 100*45, 152.4*42Plate target: 8*133*140, 8*153*1108, 10*53.6*585, 10*159*1519; Tube target: 141**125*1550, 89.4*8*1960, 152*125*966. 152*125*1566, 70*56*1050, 70*56*2100; |
| 表面 | Descaled, sandblasted, ground, rough turned, precision turned, polished |
| Delivery Condition | Hot rolled, Cold worked, Annealing, Quenching |
Applications Of Titanium Target
With the rapid development of semiconductors, electronic information and other high-tech fields, the amount of high purity titanium in target materials is increasing. Titanium targets made by sputtering coating technologies have the higher purity and smaller possible average grain sizes for use in semiconductor, electronic information, physical vapor deposition (PVD) display, chemical vapor deposition (CVD) and optical applications.
Semiconductor applications sector:
- Flat Panel Display
- Integrated Circuits
Yutong Metal specializes in producing various of titanium products, high purity titanium sputtering targets for the semiconductor and electronic information industry with the shape of plate, disc and tubing.
